Drain bias effects on statistical variability and reliability and related subthreshold variability in 20-nm bulk planar MOSFETs
نویسندگان
چکیده
منابع مشابه
Drain Bias Effects on Statistical Variability and Reliability and Related Subthreshold Variability in 20-nm Bulk Planar MOSFETs
Statistical variability and reliability due to random discrete dopants (RDD), gate line edge roughness (LER), metal gate granularity and N/PBIT associated random charge trapping has limited the progressive scaling of bulk planar MOSFETs beyond the 20-‐nm technology ...
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ژورنال
عنوان ژورنال: Solid-State Electronics
سال: 2014
ISSN: 0038-1101
DOI: 10.1016/j.sse.2014.04.017